Plasma Cleaners, Etchers & Ashers

Hydrocarbon contamination is the most common cause of specimen degradation in an electron microscope, polymerising under the beam into a dark deposit. Plasma cleaning removes it in minutes, and the same instruments serve for ashing and controlled surface etching.

Overview

Hydrocarbon films from handling, storage and pump oil are almost unavoidable, and under an electron beam they polymerise into a carbon deposit that obscures detail and worsens with every scan. A low-pressure oxygen or argon plasma removes these contaminants by converting them to volatile products that the pump carries away, cleaning both the specimen and the holder without mechanical contact or solvents. The same technology serves for ashing organic matrices to leave an inorganic residue, and for controlled etching to reveal structure in polymers and composites. SPI's Plasma Prep range covers TEM holder cleaning, barrel etching, parallel-plate and reactive ion etching, and a compact microwave benchtop unit.

Manufacturer: SPI Supplies — USA

Local sales, installation, and technical support in Bangladesh by trained local engineers.

Models

Plasma Prep III Plasma Cleaner for TEM Holders
SPI Supplies manufactures this equipment under a license agreement with Argonne National Laboratory.
Plasma Prep III Etcher, Solid State Design
Barrel plasma etcher succeeding the Plasma Prep II, with greater stability and reproducible conditions for low-power work.
Plasma Prep X Parallel Plate Plasma Etcher
Chamber material, Pyrex or quartz, is selected based on the process gas in use.
Plasma Prep Reactive Ion Etcher (RIE)
The Plasma Prep RIE is a tabletop reactive ion etching system that provides anisotropic, directional dry etching at a moderate cost compared to full production RIE tools.
Plasma Prep Jr. Barrel Microwave Plasma Etcher/Asher/Cleaner
A range of accessories, including a gas controller, ion trap, water recirculator, and process platform, extend the base system's capability.