Plasma Prep III Plasma Cleaner for TEM Holders

Overview

The Plasma Prep III Plasma Cleaner is a compact benchtop instrument that uses a dry plasma process to remove hydrocarbon contamination from TEM specimen holders and, optionally, from the samples themselves. It operates at very low RF power, typically 1 to 10 watts, which is enough to dislodge surface-held contamination without etching the holder, rod, or specimen. The design is the same type of plasma cleaner used in research that demonstrated that removing this contamination significantly improves TEM image contrast and data quality. SPI Supplies manufactures this equipment under a license agreement with Argonne National Laboratory. The unit is highly portable and intended to sit alongside a TEM for routine holder cleaning between sessions.

Low-Power Isotropic Cleaning

The barrel-type chamber gives isotropic plasma exposure, reaching into the nooks and crannies of a specimen holder and the contact areas between holder and specimen. Operation from 1 to 100 watts, with most work done between 1 and 10 watts, allows the use of argon without damaging the holder, rod, or specimen.

Field-Proven Argonne-Licensed Design

The unit is based on the same type of plasma cleaner used by Dr. Nestor Zaluzec in research at Argonne National Laboratory that established the link between holder contamination and reduced TEM image contrast. SPI Supplies manufactures and sells this equipment under a license agreement with Argonne.

Compact and Portable

With a footprint of roughly 10.5 in high by 14.75 in long by 12 in wide and a weight of only 32 lbs excluding the mechanical pump, the cleaner is easy to site next to a TEM. An air vent bleed control valve lets the operator precisely manage venting speed to protect fragile samples.

Distinguishing Cleaner from Etcher

A plasma cleaner such as this unit operates at very low power to gently remove thin adsorbed contamination layers, whereas a plasma etcher runs at 100 watts or higher for bulk material removal. Customers needing higher-power etching, such as photoresist removal, are directed to the standard Plasma Prep III etcher instead.

Common Specifications

Model Comparison