Imaging Ellipsometer: Accurion SIMON

The Accurion SIMON is the entry-level route into Imaging Ellipsometry, well suited to routine measurement. Visual surface metrology reveals structures and defects even on tiny features, with lateral ellipsometric resolution down to 1 µm and automatic stitching of large areas.

Park Systems Imaging Ellipsometer: Accurion SIMON — Ellipsometers

Manufacturer: Park Systems — South Korea

Overview

Accurion SIMON — Surface Inspection Metrology by Accurion — is the entry-level system into Imaging Ellipsometry, well suited for routine measurements. Visual surface metrology demonstrates structures or defects even on tiny features, making the technique as simple as possible to apply. It is also a natural addition alongside any non-imaging ellipsometer.

Key Features

Imaging Ellipsometry with a lateral ellipsometric resolution down to 1 µm. Thickness and refractive index measurement of microstructures. Fast visualisation of layer thickness distribution and hidden defects over large areas.

Large-Area Inspection and Automatic Flake Search

SIMON automatically stitches large areas with smooth transitions, so a complete 4-inch wafer is inspected within 47 minutes while observing defects, particles, and inhomogeneities as small as 10 µm. It also searches for flakes or materials of a desired thickness. Because the measurement is imaging-based, histogram analysis of a single measurement gives detailed insight into the distribution of thickness and inhomogeneity.

Thickness Mapping and Refractive Index

Combining ellipsometry with microscopy produces thickness maps comparable to AFM measurements, but obtainable for buried layers as well as top surfaces. A map of approximately 500 µm × 550 µm is measured in less than a minute, with thickness resolution below 0.01 nm over a range of 0.01 nm to 5 µm. The ellipsometric mode also determines refractive index, so variations such as those in laser-scribed holographic gratings or waveguides can be visualised.

Configuration Possibilities

Objectives of 2×, 5×, 10×, 20×, and 50× magnification adjust field of view and lateral resolution to the sample. Light sources range from one to six selectable LEDs between 380 nm and 1000 nm, a 658 nm or 488 nm laser, or a filter wheel offering 45 wavelengths from 360 nm to 1000 nm. Manual or motorised X-Y stages, tilt alignment, and Z-lift complete the configuration.

About Accurion

Park Systems GmbH — the Accurion Division in Göttingen, Germany — has built imaging ellipsometers since 1996, originally as Nanofilm Technology, a spin-off of the Max Planck Institute for Biophysical Chemistry. Accurion merged into Park Systems in 2022, joining the world's leading range of nanoscale metrology instruments.

Specifications

SpecificationAccurion SIMON
Ellipsometer TypeImaging Ellipsometer (IE) or Spectroscopic Imaging Ellipsometer (SIE)
Lateral Ellipsometric Resolution2 µm (depending on objective; down to 1 µm)
Thickness Range and Precision0.01 nm to 5 µm [±0.01 nm] (depending on sample/substrate combination)
Refractive Index Precision0.001
Δ / Ψ Precision0.004° / 0.002° (measured on PSI standard 300 nm SiO₂/Si wafer)
DetectorMonochrome CCD camera, 1392 × 1040 pixels, 12 bit, max. 40 frames per second
Angle of IncidenceFixed, pre-selected: 45°, 53°, or 60°
Measurement PrincipleNon-contact microscopic surface metrology using polarised light
Measurement MethodNulling / rotating compensator
Computer and SoftwareWindows™ computer with pre-installed Accurion software packages

Configuration Options

ItemOptionsTechnical Details
Objectives2×, 5×, 10× (standard), 20×, and 50× magnificationAdjust field of view and lateral ellipsometric resolution to sample demands
Light SourcesLEDs: 1 (standard) to 6 different wavelengths selectable within 380 nm to 1000 nm; laser 658 nm or 488 nm; filter wheel with 45 wavelengths from 360 nm to 1000 nmWith a filter wheel or multi-LED box, spectra can be measured to determine refractive index versus wavelength
X-Y StagesManual 100 mm travel (standard); motorised 100/200/310 mm travelMotorised tables are required for large-area stitching such as full wafer scans
AlignmentAdjustable tilting range ±4°, manual (standard) or motorisedAligning sample tilt to the measurement system is crucial for accurate ellipsometry
Z-LiftTravel range 50 mm, manual (standard) or motorisedThe motorised version is recommended when samples of differing heights are measured automatically

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