Large Sample AFM: Park NX20 300 mm
Park NX20 300 mm is an atomic force microscope for large-sample research and 300 mm wafer failure analysis. It delivers precise, repeatable nanoscale measurements and serves as a bridge for facilities transitioning from research-scale AFM to inline production.
Manufacturer: Park Systems — South Korea
Overview
Park NX20 300 mm is an atomic force microscope designed for large-sample research and 300 mm wafer failure analysis, making it a key platform for industrial R&D. As Park Systems' original 300 mm sample AFM, it delivers precise and repeatable nanoscale measurements, is widely used in academia, and serves as a bridge for facilities transitioning from research-scale AFM to inline production.
Outstanding NX Mechanical Design
The system features a direct on-axis optical microscope with integrated LED illumination for real-time vision of both probe and sample. A vertically aligned, motorized Z stage and focus stage – software-controlled for automatic tip-to-sample approach – ensure precision and ease of use, and the motorized XY sample stage enables navigation and sequential measurements across multiple coordinates with a fine step resolution of 0.6 µm.
Fast Z Servo and High Resolution
The NX Z scanner, built with a stacked piezo actuator and a strain gauge sensor, delivers fast and precise measurements across a wide range of surfaces, maintaining consistent roughness linearity regardless of scan size. It maintains straightness within 0.1% across the usable range, with out-of-axis motion under 5 nm even at a full 15 µm extension, for reliable, distortion-free nanoscale measurements.
Pre-Mounted Probes and Modular Expansion
Pre-aligned probe chip carriers with kinematic mounting points and magnetic seating make probe exchange reliable and repeatable. Advanced AFM modes are enabled by plugging an option module into the expansion slot – the modular NX design is compatible with options across the product line.
Orthogonal Scan System and True Non-Contact™ Mode
Conventional AFMs with tube scanners suffer from out-of-plane motion and axes crosstalk, resulting in image distortion, especially over large scan areas. Like all Park AFMs, this system employs an advanced orthogonal scan system with a flexure-guided architecture: a 2D flexure scanner moves the sample in the XY plane, while a separate 1D flexure scanner independently controls the probe's Z-axis motion. This separated scanner design ensures highly orthogonal, linear scans with minimal out-of-plane motion, and closed-loop servo control with low-noise sensors delivers precise, repeatable scanning across all axes.
True Non-Contact™ mode is a proprietary technology exclusively offered by Park Systems. It obtains topography by detecting the attractive van der Waals force between the AFM tip and the sample surface, preventing destructive tip-sample interaction during the scan. The result is high-resolution, accurate data with prolonged tip life and preserved sample integrity – even on the most delicate or fragile samples.
Software
Park SmartScan™ is an advanced AFM operating software featuring an elegant, intuitive interface and powerful features designed for superior image quality and an enhanced user experience. Park SmartAnalysis™ complements it with fast image processing, comprehensive data analysis, and efficient result publication.
Specifications for Park NX20 300 mm
| Specification | Park NX20 300 mm |
|---|---|
| Sample Size | Up to 300 mm; thickness up to 20 mm |
| XY Scan Range | 100 µm |
| Z Scan Range | 15 µm, 30 µm (optional) |
| XY Working Range | 300 mm × 300 mm motorized traveling range – full coverage of 300 mm wafers |
| XY Sample Stage | Motorized; 0.6 µm fine step resolution; sequential measurements across multiple coordinates |
| Digital Lock-in Amplifier | 4 channels |
| Measurement Capabilities | Topography, nanomechanical, and magnetic properties (standard); electrical, thermal, in-liquid imaging, and recipe creation for automated wafer sample measurement/analysis (optional); single-click AFM automation adjustment of sample parameters |
| Scan System | Orthogonal scan system: flexure-guided 2D XY scanner (sample) and independent 1D Z scanner (probe); closed-loop servo control |
| Imaging Mode | True Non-Contact™ mode (Park proprietary) plus standard AFM imaging and property-mapping modes |
| Z Scanner | Stacked piezo actuator with strain gauge sensor; straightness within 0.1%; out-of-axis motion under 5 nm at full 15 µm extension |
| Approach | Motorized Z stage and focus stage with software-controlled automatic tip-to-sample approach |
| Light Source | Superluminescent diode (SLD) with low-coherence illumination for stable signal detection |
| Expandability | Expansion slot for advanced mode and option modules; slide-to-connect AFM head with dove-tail rail |
| Software | Park SmartScan™ operating software; Park SmartAnalysis™ image analysis software |