Large Sample AFM: Park NX15
Park NX15 is a versatile atomic force microscope engineered for dependable performance. Its sample stage accommodates full coverage of wafers up to 150 mm, providing a reliable platform for nanoscale metrology in semiconductor and materials research, as well as polymers and bioengineering.

Manufacturer: Park Systems — South Korea
Overview
Park NX15 is a versatile atomic force microscope engineered for dependable performance. Its sample stage accommodates full coverage of wafers up to 150 mm, providing a reliable platform for nanoscale metrology in semiconductor and materials research, as well as polymers and bioengineering.
Outstanding NX Mechanical Design
NX15 is built around improved XY and Z scanner performance: fast Z-servo speed for quick vertical response, improved Z scan straightness for accurate imaging, and precise XY positioning during scans. The NX Z scanner, built with a stacked piezo actuator and a strain gauge sensor, delivers fast and precise measurements across a wide range of surfaces, maintaining consistent roughness linearity regardless of scan size. It maintains straightness within 0.1% across the usable range, with out-of-axis motion under 5 nm even at a full 15 µm extension, for reliable, distortion-free nanoscale measurements.
NX Laser Beam Path and Pre-Mounted Probes
The NX head integrates a superluminescent diode providing low-coherence illumination, guided through precision mirrors to the cantilever and position-sensitive photodetector. Pre-aligned probe chip carriers with kinematic mounting points and magnetic seating ensure reliable, repeatable probe exchange.
Modular Expansion and On-Axis Optics
Advanced AFM modes are enabled by plugging an option module into the expansion slot, compatible with options across the NX product line. The high-power on-axis optical microscope with software-controlled LED illumination provides a clear view of the sample surface.
Orthogonal Scan System and True Non-Contact™ Mode
Conventional AFMs with tube scanners suffer from out-of-plane motion and axes crosstalk, resulting in image distortion, especially over large scan areas. Like all Park AFMs, this system employs an advanced orthogonal scan system with a flexure-guided architecture: a 2D flexure scanner moves the sample in the XY plane, while a separate 1D flexure scanner independently controls the probe's Z-axis motion. This separated scanner design ensures highly orthogonal, linear scans with minimal out-of-plane motion, and closed-loop servo control with low-noise sensors delivers precise, repeatable scanning across all axes.
True Non-Contact™ mode is a proprietary technology exclusively offered by Park Systems. It obtains topography by detecting the attractive van der Waals force between the AFM tip and the sample surface, preventing destructive tip-sample interaction during the scan. The result is high-resolution, accurate data with prolonged tip life and preserved sample integrity – even on the most delicate or fragile samples.
Software
Park SmartScan™ is an advanced AFM operating software featuring an elegant, intuitive interface and powerful features designed for superior image quality and an enhanced user experience. Park SmartAnalysis™ complements it with fast image processing, comprehensive data analysis, and efficient result publication.
Specifications for Park NX15
| Specification | Park NX15 |
|---|---|
| Sample Capacity | Wafers up to 150 mm (vacuum grooves); magnetic mount for 16 small samples (optional) |
| Scanner | XY scanner 100 µm × 100 µm; flexure-guided high-force Z scanner: 15 µm or 30 µm |
| Stage | XY stage 150 mm × 150 mm; Z stage 25 mm; focus stage 8 mm |
| On-Axis Optics | Direct on-axis vision of sample surface and cantilever; field of view 480 µm × 360 µm (with 10× objective); 1.2 M pixel CCD (5 M pixel optional) |
| Imaging Mode | True Non-Contact™ mode (Park proprietary) plus standard AFM imaging and property-mapping modes |
| AFM Modes | Topographic (contact, True Non-Contact™, tapping, PinPoint™, Fast PinPoint™); mechanical (nanomechanical modes, F-D spectroscopy, nanoindentation, FMM, DMA, TFM, LFM); electrical (C-AFM with photocurrent mapping, STM, SCM, PFM variants, EFM, KPFM variants, MIM); magnetic (MFM variants); in-liquid topography; electrochemical AFM (EC-AFM); nanolithography and nanomachining; options marked by Park as requiring additional configuration |
| Probe Mounting | Pre-aligned probe chip carriers with kinematic mounting points and magnetic seating |
| Dimensions | Acoustic enclosure (outer): 820 mm × 920 mm × 1,486 mm; desk: 1,410 mm × 810 mm × 740 mm |
| Total Weight | 470 kg (AFM body + acoustic enclosure) |
| Required Environment | Acoustic noise level below 65 dB; floor vibration level VC-D (6.25 µm/s); power 1 kW (maximum) |
| Software | Park SmartScan™ operating software; Park SmartAnalysis™ image analysis software |
