Large Sample AFM with Nano-IR: Park FX200 IR
Park FX200 IR combines chemical and surface characterization on the proven FX200 platform, supporting samples up to 200 mm. Photo-induced Force Microscopy (PiFM) enables IR spectral analysis and chemical imaging at the nanoscale with sub-5 nm resolution.
Manufacturer: Park Systems — South Korea
Overview
Park FX200 IR is Park Systems' advanced AFM solution for nanoscale infrared spectroscopy and imaging, combining chemical and surface characterization. It is built on the proven FX200 platform supporting samples up to 200 mm, with low noise, minimal thermal drift, and high mechanical stability for reliable high-resolution metrology.
Nanoscale Chemical Imaging with PiFM
FX200 IR supports Photo-induced Force Microscopy (PiFM), enabling both IR spectral analysis and chemical imaging at the nanoscale – chemical information acquired together with high-resolution surface characterization on the same sample.
Proven FX200 Foundation
The system combines the Park FX200 large-sample AFM with Park's nano-IR spectrometers. Like all Park AFMs, it features the orthogonal scan system and True Non-Contact™ mode, delivering consistent, non-invasive measurements even on fragile samples.
Automated Workflows
Automation features such as automatic probe exchange, IR beam alignment, a full 200 mm sample-view camera, and multi-point measurement streamline operation and simplify workflows.
Orthogonal Scan System and True Non-Contact™ Mode
Conventional AFMs with tube scanners suffer from out-of-plane motion and axes crosstalk, resulting in image distortion, especially over large scan areas. Like all Park AFMs, this system employs an advanced orthogonal scan system with a flexure-guided architecture: a 2D flexure scanner moves the sample in the XY plane, while a separate 1D flexure scanner independently controls the probe's Z-axis motion. This separated scanner design ensures highly orthogonal, linear scans with minimal out-of-plane motion, and closed-loop servo control with low-noise sensors delivers precise, repeatable scanning across all axes.
True Non-Contact™ mode is a proprietary technology exclusively offered by Park Systems. It obtains topography by detecting the attractive van der Waals force between the AFM tip and the sample surface, preventing destructive tip-sample interaction during the scan. The result is high-resolution, accurate data with prolonged tip life and preserved sample integrity – even on the most delicate or fragile samples.
Specifications for Park FX200 IR
| Specification | Park FX200 IR |
|---|---|
| Sample Capacity | Samples up to 200 mm (Park FX200 platform) |
| Base Platform | Park FX200 large-sample AFM combined with Park Nano-IR Spectrometers |
| IR Technique | Photo-induced Force Microscopy (PiFM): fully non-contact nanoscale IR spectroscopy and chemical imaging; sub-5 nm spatial resolution with monolayer sensitivity |
| IR Laser Options | QCL laser (3 modules): 1,800 – 770 cm⁻¹ typical Extended QCL laser (4 modules): 2,395 – 1,995 cm⁻¹ and 1,800 – 770 cm⁻¹ typical QCL + OPO laser: adds 7,117 – 4,950 cm⁻¹ and 4,385 – 2,281 cm⁻¹ typical QCL + OPO/DFG laser: adds 806 – 589 cm⁻¹ typical |
| IR Automation | Fully automated IR beam alignment using the measured nano-IR signal as real-time feedback; automatic probe exchange; vision-guided AFM laser alignment |
| Acoustic Enclosure (Outer) | 1,250 mm × 1,280 mm × 1,570 mm |
| Cabinet | 1,200 mm × 900 mm × 1,890 mm |
| Total Weight (AFM Body + Enclosure) | 2,290 kg |
| Required Environment | Acoustic noise level 65 dB; floor vibration level VC-D (6.25 µm/s); power 2.3 kW (maximum) |
| Available Options | Facility controller; XEA software; KnowItAll software |
| Note | Specifications, including dimensions and weight, may differ depending on the laser configuration. |
| Scan System | Orthogonal scan system: flexure-guided 2D XY scanner (sample) and independent 1D Z scanner (probe); closed-loop servo control |
| Imaging Mode | True Non-Contact™ mode (Park proprietary) plus standard AFM imaging and property-mapping modes |
| AFM Modes | Topographic (contact incl. Fast Imaging Mode, True Non-Contact™, tapping, PinPoint™, Fast PinPoint™); mechanical (nanomechanical modes, F-D spectroscopy, nanoindentation, FMM, LFM); electrical (C-AFM, SSRM, PFM incl. DFRT-PFM, EFM, KPFM variants); magnetic (MFM variants); thermal (SThM); nanolithography and nanomachining (options) |
| Software | Park SmartScan™ operating software; Park SmartAnalysis™ image analysis software |