UV Prep for SEM Sample Cleaning

The UV Prep for SEM is a UV/ozone instrument designed to remove thin hydrocarbon contamination from sample surfaces prior to SEM examination without affecting the underlying sample.

SPI Supplies UV Prep for SEM Sample Cleaning — UV Sample Cleaning Systems

Manufacturer: SPI Supplies — USA

Overview

The UV Prep for SEM is a UV/ozone instrument designed to remove thin hydrocarbon contamination from sample surfaces prior to SEM examination without affecting the underlying sample. This contamination, picked up from open-air storage or handling, becomes especially problematic at the low beam energies used by modern FE-SEMs, where the electron beam ends up imaging the surface film rather than the true sample. A customized UV source breaks up the hydrocarbon bonds while reactive oxygen species convert them into water, CO, and CO2, which are pumped out of the chamber through a small diaphragm pump. A built-in ozone scrubber ensures generated ozone is not released into the lab environment. The system is safe to use on metals, metal oxides, ceramics, semiconductors, battery cathode materials, polymers, carbon nanotubes, graphene, carbon fiber, anti-reflective coatings, and biological samples.

UV/Ozone Surface Cleaning

A customized UV source attacks and breaks up hydrocarbon bonds on the sample surface while reactive oxygen species react with them to form water, carbon monoxide, and carbon dioxide, which are removed from the chamber by a small diaphragm pump under mild vacuum.

Reduces Imaging Artifacts

Removing surface hydrocarbons before imaging reduces the black-box effect caused by raster burn or electron-beam-induced deposition of contaminants, which is particularly important for FE-SEM users running at low beam energies to reveal fine surface detail.

Wide Sample Compatibility

The UV Prep is safe to use on metals, metal oxides, ceramics, semiconductors, lithium battery cathode materials, polymers, carbon nanotubes, graphene, carbon fiber, anti-reflective coatings, and biological samples.

Simple, Microprocessor-Controlled Operation

Users simply load samples, set the cleaning time and vacuum level, and run the process, with typical run times of 5 to 15 minutes. A built-in ozone scrubber prevents generated ozone from being released into the lab, and the system can also be used to store samples under vacuum until they are examined.

Common Specifications

SpecificationUV Prep for SEM Sample Cleaning
Cleaning time0 to 30 minutes, 1 minute steps
Vacuum systemDry pumping system
Pump-down timeUnder 120 seconds
Dimensions360 x 390 x 480 mm
Weight17 kg
Input powerSingle phase, 100 to 240 V (50/60 Hz)
ControlMicroprocessor controlled
ModesVacuum Clean / Storage
Indicative list price (USD)$17,340.00

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