UV Sample Cleaning Systems

UV-ozone cleaning removes organic contamination photochemically: short-wavelength ultraviolet light breaks hydrocarbon bonds while generating ozone that oxidises the fragments to volatile products, leaving the surface clean without ion bombardment.

SPI Supplies — UV Sample Cleaning Systems

Overview

Not every specimen tolerates a plasma. Ion bombardment can sputter soft surfaces, alter delicate structures and charge insulating samples, yet the hydrocarbon contamination still has to go. UV-ozone cleaning offers a gentler route: short-wavelength ultraviolet light dissociates the hydrocarbon molecules directly while simultaneously converting atmospheric oxygen to ozone, which oxidises the fragments to carbon dioxide and water that simply evaporate. There is no bombardment, no vacuum requirement and no solvent. It suits specimens and holders that need cleaning before high-resolution imaging or surface analysis but cannot withstand a plasma.

Manufacturer: SPI Supplies — USA

Local sales, installation, and technical support in Bangladesh by trained local engineers.

Models

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