Silicon Nitride Both Side Wafers
These substrates are silicon wafers coated on both sides with a thin film of silicon nitride (Si3N4), supplied by SPI Supplies for applications requiring a robust, chemically resistant dielectric coating on a rigid silicon support.
Manufacturer: SPI Supplies — USA
Overview
These substrates are silicon wafers coated on both sides with a thin film of silicon nitride (Si3N4), supplied by SPI Supplies for applications requiring a robust, chemically resistant dielectric coating on a rigid silicon support. The 100 nm thick Si3N4 coating is deposited on both faces of a 200 micrometer thick, 100 mm diameter silicon wafer, giving a symmetric, low-stress structure suited to further micromachining or use as a coated support wafer. Silicon nitride coatings of this type are valued for their chemical inertness, hardness, and dielectric properties in semiconductor and materials science sample preparation. The wafers are supplied in multi-piece packs to support batch processing workflows.
Coating and Wafer Specification
Each wafer is 100 mm in diameter and 200 micrometers thick, with a 100 nm thick Si3N4 layer deposited on both sides. This both-side coating configuration provides a balanced, low-stress film compared to single-side coated wafers.
Specifications
| Specification | Silicon Nitride Both Side Wafers |
|---|---|
| Substrate | Silicon (Si) wafer |
| Coating | Silicon Nitride (Si3N4), 100 nm thick, both sides |
| Wafer Diameter | 100 mm |
| Wafer Thickness | 200 µm |
| Pack Sizes | 5, 10, or 25 wafers |
| Typical Applications | Dielectric-coated support wafer, semiconductor sample preparation, micromachining |