Osmium Plasma Coaters
Osmium plasma coating produces an amorphous, ultra-thin conductive film with no grain structure of its own, making it the coating of choice when the specimen must be imaged at the resolution a field-emission SEM is capable of.
Overview
Sputtered gold and gold-palladium films have a grain structure that becomes visible at high magnification, setting a ceiling on what a field-emission SEM can usefully resolve. Osmium plasma coating avoids this: osmium is deposited from a gaseous precursor as a genuinely amorphous film, continuous at thicknesses of a few nanometres and free of the island growth that afflicts sputtered metals. The result is a conductive, uniform coating that follows fine surface detail rather than obscuring it, which matters for biological specimens, polymers and nanostructured materials. SPI offers the OPC-60A for routine automatic operation and the OPC-80T with a larger chamber and the option of carbon deposition.
Manufacturer: SPI Supplies — USA
Local sales, installation, and technical support in Bangladesh by trained local engineers.
Models
Osmium Plasma Coater: OPC-60A
Unlike the OPC-80T, the OPC-60A cannot deposit carbon and is dedicated solely to osmium coating.
Osmium Plasma Coater: OPC-80T
The osmium source is osmium tetroxide in sealed glass ampoules, while the carbon source is technical-grade naphthalene, which is sublimated to deposit the carbon film.
NEED MORE INFORMATION?
Our applications team can provide detailed specifications, application notes, and a formal quotation.
Request a Quote