300 kV TEM — Model: JEM-ARM300F2 GRAND ARM™2

Overview

The JEM-ARM300F2 "GRAND ARM2" is JEOL's upgraded atomic resolution analytical electron microscope. It enables observation at ultrahigh spatial resolution combined with highly sensitive analysis over a wide range of accelerating voltages.

Key opgrades include the newly developed FHP2 objective lens polepiece that combines ultrahigh spatial resolution with highly sensitive X-ray analysis; the WGP objective lens polepiece for ultrahighly sensitive analysis and In-situ experiments; JEOL Cs correctors with the Corrector System Module (JEOL COSMO™); a Cold Field Emission Electron Gun (CFEG) provided as standard; and a new enclosure that is not affected by external disturbances.

FHP2 Objective Lens Polepiece

Combined ultrahigh spatial resolution with highly sensitive analysis capability. The FHP objective lens polepiece, optimized for ultrahigh spatial resolution observation and analysis, has been upgraded. While maintaining this capability, the shape of the polepiece was further optimized for the X-ray take-off angle of the large-sized SDDs (158 mm²), improving the solid angle for EDS acquisition. As a result, the effective X-ray detection efficiency of the FHP2 is more than twice as sensitive as that of the FHP.

Highly sensitive X-ray analysis at ultrahigh resolution

Highly sensitive X-ray analysis can be performed at ultrahigh spatial resolution. Compared with the previous FHP, more than double the X-ray detection efficiency (total solid angle of 1.4 steradians) can be achieved with the FHP2.

Low optical coefficients over a wide voltage range

Low optical coefficients — low Cc coefficient and low Cs coefficient — enable ultrahigh spatial resolution and highly sensitive X-ray analysis to be performed over a wide range of accelerating voltages. Guaranteed STEM resolution: 53 pm @ 300 kV, 96 pm @ 80 kV. (This is the case when the STEM Expanding Trajectory Aberration (ETA) Corrector is incorporated.)

Clean, highly sensitive X-ray analyses

The effective X-ray sensitivity of the GRAND ARM™ 2 with the combination of the FHP2 and two SDDs (Dual SDD) of 158 mm² is about 1.4 times more sensitive than a configuration of another microscope with UHR objective lens polepiece and Dual SDD of 100 mm². Optimizing the detectors, the shape of the specimen holders and the detector positions all help in reducing system peaks, making it possible to acquire clean EDS spectra with high P/B ratio. Spurious Peaks < 0.5%; Ni P/B > 4,000.

WGP Objective Lens Polepiece for Ultrahighly Sensitive Analysis

Feasible to carry out ultrahighly sensitive X-ray analysis and various types of In-situ experiments. Other than the FHP2, the WGP objective lens polepiece can be selected with the GRAND ARM™ 2. The WGP has a wide gap between the upper pole and lower pole.

Ultrahighly sensitive X-ray analysis

Because of a wide gap, the WGP allows large-sized SDDs to be brought closer to the specimen than the FHP2, allowing ultrahighly sensitive X-ray analysis to be performed (total solid angle of 2.2 steradians). With the JEOL Expanding Trajectory Aberration (ETA) Corrector, HAADF STEM resolution of 59 pm can be achieved and atomic resolution EDS maps can be acquired.

In-situ experiments

Thick special specimen holders are able to fit within the polepiece gap, making it possible for various types of In-situ experiments to be performed.

JEOL Cs Corrector & Corrector System Module (JEOL COSMO™)

Cs correctors developed by JEOL are used on the GRAND ARM™ 2. Incorporating the FHP2 into this system can achieve a STEM spatial resolution of 53 pm, and using the WGP with this system can achieve a STEM spatial resolution of 59 pm (@ 300 kV). JEOL COSMO™, Corrector System Module, makes it possible to execute aberration correction easily and quickly.

JEOL Expanding Trajectory Aberration (ETA) Corrector

The ETA Corrector together with the Corrector System Module (JEOL COSMO™) provides quick and accurate aberration correction. JEOL COSMO™ uses only 2 Ronchigrams acquired from any amorphous area to measure and correct aberrations. Therefore, the system can provide quick and accurate aberration correction without dedicated specimens. Residual aberrations are automatically measured from only two Ronchigrams of under focus and over focus.

Cold Field Emission Electron Gun (CFEG)

A cold field emission electron gun (CFEG) is equipped as standard, providing high-brightness, high-stability and a smaller energy spread. It is effective for EDS and EELS analysis for extended periods of time. Probe current stability is < 10% @ 8 hr (measured value), with an energy spread of < 0.35 eV @ 300 kV — less than half the energy spread compared to Schottky.

Enclosure

A new enclosure is standard configuration, not affected by the external environment. Adopting an enclosure to cover the instrument reduces external disturbances such as air flow, changes of room temperature and acoustic noise.

Specifications